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2005.7.12-14 Participated
in SEMICON West 2005
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Raytex participated in SEMICON West 2005,
held in San Francisco in July.
Booths representing both front-end and back-end
processes were combined at Moscone Center
starting from this year.
This is the world’s largest trade show, hosting
more than 3,500 participant companies.
Various events and seminars are held |
concurrently with
SEMICON West, and Raytex used the opportunity
to collect information on industry trends
and the latest technologies.
Raytex had the honor of hosting visiting customers, and was visited in particular
by numerous major wafer manufacturers and U.S. device manufacturers. The majority
of these visitors were pre-prepared with specific and detailed requests for us
to explain and discuss our products. |
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2004.12.1-3 Raytex Exhibits at Semicon Japan 2004
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Raytex took the opportunity to present its products as an exhibitor at Semicon Japan 2004, held on Dec. 1 through Dec. 3, 2004 at the Makuhari Messe Exhibit Hall.
Semicon Japan is the largest exhibition held in Japan for the semiconductor manufacturing industry. Exhibitors from 26 countries, representing 1,610 companies, took part in the exhibition, which welcomed over 100,000 visitors in 2004.
The Raytex product exhibit included 3 actual systems, including the EdgeScan PLUS wafer edge inspection system for device manufacturing applications, to introduce its newest technology as a new industry presence.
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2004.
10.1 Sales Launch of EdgeScan PLUS
 Already
in the business of sales of inspection systems
to help wafer manufacturers in resolving defect
problems with the EdgeScan product as its main
product offering, on October 1, 2001 Raytex initiated
sales of its EdgeScan PLUS product, aimed at the
Device Manufacturing market.
To that point no inspection systems available on the market was targeted specifically
to assist in the fight against material residue
and film stress at wafer edges.
The EdgeScan PLUS is a unique system that performs high-level automatic monitoring,
leveraging Raytex’s proprietary high-tech solutions
including optimized resolution, to address the
ever-changing conditions of the wafer edge as it
goes through film layering at each
device process stage.
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2004.9.27 Rights Acquired to NanoPro NP1
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【What
is the "NanoPro NP1"?】
The NanoPro NP1 is a double-sided wafer metrology system utilizing a glancing interferometry method. It is entirely unprecedented in the world in its ability to measure wafer flatness and other conditions at high accuracy with contact at the wafer edge only.
Fully using the advantages of glancing interferometry, the NanoPro NP1 makes it possible to measure wafers during the wafer pre-manufacturing stages, which was previously impossible. This one system can perform measurements at all stages from pre-stages at the production facility, up to final inspection before product shipment.
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Raytex acquired patent and trademark rights to the NanoPro NP1 product, previously manufactured by a KLA-Tencor Corporation, an equipment manufacturer of proven track record in the wafer measurement and inspection field, and has begun sales of this system worldwide.
Previously, Raytex offered its in-house designed DynaSearch XP product for applications in wafer flatness and nanotopography single-sided measurement. Now with the industry shift toward double-sided polishing, Raytex offers its NanoPro NP1 product, designed for double-sided simultaneous measurement applications, which enables even greater reduction in the development cycle.
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