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 This system uses a telecentric optics and illumination system and a digital micromirror device (DMD) to perform exposure for R&D purposes. This tool exposes the customer’s desired pattern, drafted on a PC, onto resist without the need for a mask. This equipment offers a rapid loop between user development concept and realization, dramatically enhancing efficiency in research prototyping.
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- Can pattern resist down to a minimum 1μm pixel size with ease.
- Usable on any substrate material and shape.
- Features auto-focus and automatic alignment functions.
- Compactly sized, easy maintenance
- Can also draft grey-scale patterns
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- Optical semiconductor device development
- Communications device development
- Light-cured materials development
- Micro ID numbering
- MEMS
- μTAS
- Localized or selective exposure, etc. applications
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| * New equipment development, etc. will be pursued based upon separate consultation |
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