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| Laser Scattering Topography Defect Scanner |
 Next generation total wafer inspection system featuring classification and inspection of near-surface defects, particles and surface roughness
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- Classifies and measures defects, particles and haze
- Fully automated inspection using auto-loader
- Cleanroom-compatible system adds no particles during measurement
- Boasts a maximum sensitivity of 40nmΦ
- Particle detection threshold of 60nmΦ without dependence on surface conditions
- Cluster scan method enables stable measurement conditions
- Unique Imager function for simultaneous observation of scatter image
- Models available for 300mm or 200mm wafers
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- 2μ resolution address data output function
- Real-time data communication function
- Selectable 5μ/1μ surface observation function
- Full mapping/measurement of defects, particles and haze
- Provides defect and particle size information
- High-speed full-surface measurement at 1 hour per 200mm wafer
- Direct laser marking for further defect analysis
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| Near surface defect mapping (within 5μ）
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| Particle mapping on the surface
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